Invention Grant
- Patent Title: Embossing method and apparatus
- Patent Title (中): 压花方法和装置
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Application No.: US10512877Application Date: 2003-05-13
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Publication No.: US07824516B2Publication Date: 2010-11-02
- Inventor: Richard M Amos , Guy P Bryan-Brown , Emma L Wood , John C Jones , Philip T Worthing
- Applicant: Richard M Amos , Guy P Bryan-Brown , Emma L Wood , John C Jones , Philip T Worthing
- Applicant Address: GB Malvern
- Assignee: ZBD Displays Limited
- Current Assignee: ZBD Displays Limited
- Current Assignee Address: GB Malvern
- Agency: Nixon & Vanderhye P.C.
- Priority: EP02253326 20020513; GB0227221.9 20021121
- International Application: PCT/GB03/02015 WO 20030513
- International Announcement: WO03/095175 WO 20031120
- Main IPC: B32B15/00
- IPC: B32B15/00

Abstract:
A method and apparatus for forming a patterned layer having a surface profile that provides relief structures within an electronic device. The method comprises the steps of taking a carrier film (50) having an inverse of the required surface profile formed on one side thereof, taking a layer of fixable material (54) located on a substrate (52), laminating the carrier film (50) and substrate (52) such the carrier film causes the required surface profile to be formed in the layer of fixable material with a predetermined offset, and then fixing the fixable material. Lamination may be performed using rollers (56,58) or a vacuum process. The process is designed to ensure that the offset can be kept as low as possible, preferably to within 150 nm.
Public/Granted literature
- US20050150589A1 Embossing method and apparatus Public/Granted day:2005-07-14
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