Invention Grant
- Patent Title: End-block for a rotatable target sputtering apparatus
- Patent Title (中): 用于可旋转靶溅射装置的端块
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Application No.: US11665563Application Date: 2005-10-11
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Publication No.: US07824528B2Publication Date: 2010-11-02
- Inventor: Krist Dellaert , Wilmert De Bosscher , Joannes De Boever , Stijn Porteman
- Applicant: Krist Dellaert , Wilmert De Bosscher , Joannes De Boever , Stijn Porteman
- Applicant Address: BE Deinze
- Assignee: Bekaert Advanced Coatings
- Current Assignee: Bekaert Advanced Coatings
- Current Assignee Address: BE Deinze
- Agency: Foley & Lardner LLP
- Priority: EP04105116 20041018
- International Application: PCT/EP2005/055144 WO 20051011
- International Announcement: WO2006/042808 WO 20060427
- Main IPC: C25B9/00
- IPC: C25B9/00 ; C25B13/00 ; C25B11/00 ; C23C14/00

Abstract:
An end-block for electrically energising a rotatable tubular target in a vacuum coating installation is disclosed. The end-block has a rotary electrical contact that reduces the joule heating effects when operating in alternating current mode. When compared to known end-blocks, this is achieved by increasing the number of contact areas between a contacting ring and a series of circumferentially mounted contacting shoes. Also the contact shoes are being pressed radially outwardly by means of resilient elements against the contacting ring.
Public/Granted literature
- US20080087541A1 End-Block for a Rotatable Target Sputtering Apparatus Public/Granted day:2008-04-17
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