Invention Grant
- Patent Title: Microstructure and method of manufacturing the same
- Patent Title (中): 微结构及其制造方法
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Application No.: US11699447Application Date: 2007-01-30
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Publication No.: US07824535B2Publication Date: 2010-11-02
- Inventor: Yusuke Hatanaka , Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
- Applicant: Yusuke Hatanaka , Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2006-046985 20060223
- Main IPC: C25D11/06
- IPC: C25D11/06 ; B32B3/26

Abstract:
A microstructure includes an anodized aluminum layer that has on a surface thereof micropores, at least some of which contain a catalyst, in a micropore array with a degree of ordering of at least 40%. A method of manufacturing the microstructure includes anodizing an aluminum member to form on its surface an anodized layer having micropores, removing the aluminum member, and supporting a catalyst on at least part of the anodized layer. The microstructure is excellent in heat resistance.
Public/Granted literature
- US20080057293A1 Microstructure and method of manufacturing the same Public/Granted day:2008-03-06
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