Invention Grant
US07824561B2 Method for manufacturing probe structure 有权
探针结构的制造方法

Method for manufacturing probe structure
Abstract:
A method for manufacturing a probe structure is disclosed. In accordance with the method, two semiconductor substrates having different crystal directions are bonded and selectively etched utilizing an etch selectivity due to the different crystal directions to form a probe tip region and a probe beam region. A cantilever structure for a probe card is formed by filling the probe tip region and the probe beam region with a conductive material.
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