Invention Grant
- Patent Title: Particulate silica
- Patent Title (中): 颗粒状二氧化硅
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Application No.: US11920567Application Date: 2005-05-19
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Publication No.: US07824644B2Publication Date: 2010-11-02
- Inventor: Yasuhiro Nagatani , Ryuji Ishimoto , Masao Ariyuki
- Applicant: Yasuhiro Nagatani , Ryuji Ishimoto , Masao Ariyuki
- Applicant Address: JP Shunan-shi
- Assignee: Tokuyama Corporation
- Current Assignee: Tokuyama Corporation
- Current Assignee Address: JP Shunan-shi
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- International Application: PCT/JP2005/009582 WO 20050519
- International Announcement: WO2006/123433 WO 20061123
- Main IPC: C01B33/12
- IPC: C01B33/12 ; B01D19/24 ; B60C1/00

Abstract:
There is provided particulate silica which can be suitably used as a viscoelasticity modifier such as a thickener which is added to liquid such as water, a liquid resin or paint to adjust its viscoelastic properties such as viscosity and thixotropic nature, a reinforcer or filler for silicone rubber or sealants, a polishing agent for CMP (Chemical Mechanical Polishing) or a surface coating agent for ink-jet printing paper.The particulate silica has a BET specific surface area S of 130 to 380 m2/g, and its fractal shape parameter α1 in an α-value analysis target range of 20 to 30 nm satisfies the following equation (1) and its fractal shape parameter α2 in an α-value analysis target range of 30 to 50 nm satisfies the following equation (2). α1+0.00175S
Public/Granted literature
- US20090230351A1 Particulate silica Public/Granted day:2009-09-17
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