Invention Grant
- Patent Title: Anti-reflection film, production of anti-reflection film, and multi-layer film producing apparatus
- Patent Title (中): 防反射膜,防反射膜的制造和多层膜制造装置
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Application No.: US11084120Application Date: 2005-03-21
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Publication No.: US07824740B2Publication Date: 2010-11-02
- Inventor: Naoyuki Kawanishi
- Applicant: Naoyuki Kawanishi
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2004-093073 20040326
- Main IPC: C08F2/48
- IPC: C08F2/48

Abstract:
A coater overlays actinic radiation curable composition on a long support in a liquid phase to constitute a coating layer. The actinic radiation curable composition includes polymerizable compound, and a first polymerization initiator for reacting upon ultraviolet radiation of a first wavelength range, and for rendering the coating layer semi-cured in first-stage curing. A second polymerization initiator reacts upon ultraviolet radiation of a broad wavelength range covering the first wavelength range, and completely cures the coating layer in second-stage curing after the first-stage curing, to obtain an anti-reflection layer. For the first-stage curing, optical filters are combined with an ultraviolet radiation source for the broad wavelength range, and cause transmission of radiation of the first wavelength range for reaction only upon the first polymerization initiator. In one embodiment, the optical filters are arranged in a web width direction of the long support.
Public/Granted literature
- US20050214453A1 Anti-reflection film, production of anti-reflection film, and multi-layer film producing apparatus Public/Granted day:2005-09-29
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