Invention Grant
- Patent Title: Method of forming a carbon-containing material
- Patent Title (中): 形成含碳材料的方法
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Application No.: US11848726Application Date: 2007-08-31
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Publication No.: US07824741B2Publication Date: 2010-11-02
- Inventor: Gurtej S. Sandhu
- Applicant: Gurtej S. Sandhu
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: B05D3/00
- IPC: B05D3/00

Abstract:
A method includes forming ionic clusters of carbon-containing molecules, which molecules have carbon-carbon sp2 bonds, and accelerating the clusters. A surface of a substrate is irradiated with the clusters. A material is formed on the surface using the carbon from the molecules. The material includes carbon and may optionally include hydrogen. The material may include graphene. The material may form a monolayer. The molecules may include one or more material selected from the group consisting of graphene, carbon allotropes, ethylene, and hydrocarbon molecules containing ethylenic moieties. A fused region may be formed in the substrate as an interface between the substrate and the material. The clusters may have diameters of at least 20 nanometer s and may be accelerated to an energy of at least 0.5 keV.
Public/Granted literature
- US20090061107A1 Formation of Carbon-Containing Material Public/Granted day:2009-03-05
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