Invention Grant
- Patent Title: Process and apparatus for depositing a ceramic coating
- Patent Title (中): 用于沉积陶瓷涂层的方法和设备
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Application No.: US10707469Application Date: 2003-12-16
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Publication No.: US07824744B2Publication Date: 2010-11-02
- Inventor: Ramgopal Darolia , Irene Spitsberg , Brett Allen Rohrer Boutwell
- Applicant: Ramgopal Darolia , Irene Spitsberg , Brett Allen Rohrer Boutwell
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agent William Scott Andes; Gary M. Hartman; Domenica N. S. Hartman
- Main IPC: C23C14/30
- IPC: C23C14/30

Abstract:
A process and apparatus for depositing a ceramic coating, such as a thermal barrier coating (TBC) for a gas turbine engine component. The process deposits a coating whose composition includes multiple oxide compounds and a carbon-based constituent, e.g., elemental carbon, carbides, and carbon-based gases. The process uses at least one evaporation source to provide multiple different oxide compounds and at least one carbide compound comprising carbon and an element. The evaporation source is evaporated to produce a vapor cloud that contacts and condenses on the component surface to form the ceramic coating, and particularly so that the coating comprises the oxide compounds, an oxide of the element of the carbide compound, and the carbide compound and/or a carbon-containing gas. The process is carried out with an apparatus comprising a coating chamber in which the evaporation source is present, and a device for evaporating the evaporation source.
Public/Granted literature
- US20050126494A1 PROCESS AND APPARATUS FOR DEPOSITING A CERAMIC COATING Public/Granted day:2005-06-16
Information query
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