Invention Grant
- Patent Title: Method and system for improvement of dose correction for particle beam writers
- Patent Title (中): 改进粒子束作者剂量校正的方法和系统
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Application No.: US11677973Application Date: 2007-02-22
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Publication No.: US07824828B2Publication Date: 2010-11-02
- Inventor: Akira Fujimura , Daisuke Hara , Katsuo Komuro , Takashi Mitsuhashi
- Applicant: Akira Fujimura , Daisuke Hara , Katsuo Komuro , Takashi Mitsuhashi
- Applicant Address: US CA San Jose
- Assignee: Cadence Design Systems, Inc.
- Current Assignee: Cadence Design Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Vista IP Law Group LLP
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03C5/00
Abstract:
A method and system for dose correction of a particle beam writer is disclosed. The method and system includes reading a file of writing objects that includes dose intensity, calculating a rate of dose intensity change between adjacent writing objects, selecting a writing object that may need accuracy improvement of dose correction based on the rate of dose intensity change, and improving accuracy of the dose correction of the writing object that is selected and its adjacent objects.
Public/Granted literature
- US20080203324A1 METHOD AND SYSTEM FOR IMPROVEMENT OF DOSE CORRECTION FOR PARTICLE BEAM WRITERS Public/Granted day:2008-08-28
Information query
