Invention Grant
- Patent Title: Photosensitive composition and pattern forming method using the same
- Patent Title (中): 光敏组合物和使用其的图案形成方法
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Application No.: US11847629Application Date: 2007-08-30
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Publication No.: US07824836B2Publication Date: 2010-11-02
- Inventor: Hideaki Tsubaki
- Applicant: Hideaki Tsubaki
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2006-263216 20060927
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/039 ; G03F7/20 ; G03F7/30
Abstract:
A photosensitive composition contains: a compound capable of generating an acid upon irradiation with actinic rays or radiation; a basic compound represented by the formula (I-a) as defined herein; a basic compound represented by the formula (I-b) as defined herein; and a surfactant represented by the formula (II) as defined herein.
Public/Granted literature
- US20080274421A1 PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME Public/Granted day:2008-11-06
Information query
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