Invention Grant
- Patent Title: Positive-working photoimageable bottom antireflective coating
- Patent Title (中): 正面工作的可光成像底部抗反射涂层
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Application No.: US11876332Application Date: 2007-10-22
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Publication No.: US07824837B2Publication Date: 2010-11-02
- Inventor: Hengpeng Wu , Mark O. Neisser , Shuji S Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
- Applicant: Hengpeng Wu , Mark O. Neisser , Shuji S Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
- Applicant Address: US NJ Somerville
- Assignee: AZ Electronic Materials USA Corp.
- Current Assignee: AZ Electronic Materials USA Corp.
- Current Assignee Address: US NJ Somerville
- Agent Sangya Jain
- Main IPC: G03F7/095
- IPC: G03F7/095 ; G03F7/039 ; G03F7/11
Abstract:
The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
Public/Granted literature
- US20080038666A1 Positive-Working Photoimageable Bottom Antireflective Coating Public/Granted day:2008-02-14
Information query
IPC分类:
