Invention Grant
- Patent Title: Photoacid generator compounds and compositions
- Patent Title (中): 光酸发生剂化合物和组合物
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Application No.: US12255266Application Date: 2008-10-21
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Publication No.: US07824839B2Publication Date: 2010-11-02
- Inventor: Christopher K. Ober , Yi Yi , Ramakrishnan Ayothi
- Applicant: Christopher K. Ober , Yi Yi , Ramakrishnan Ayothi
- Applicant Address: US NY Ithaca
- Assignee: Cornell Research Foundation, Inc.
- Current Assignee: Cornell Research Foundation, Inc.
- Current Assignee Address: US NY Ithaca
- Agency: Schwegman, Lundberg & Woessner, P.A.
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; G03F7/029 ; C07C303/00 ; C07D307/00
Abstract:
The invention provides various ionic and non-ionic photoacid generator compounds. Photoresist compositions that include the novel ionic and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
Public/Granted literature
- US20090136868A1 PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS Public/Granted day:2009-05-28
Information query
