Invention Grant
US07824845B2 Functionalized carbosilane polymers and photoresist compositions containing the same
有权
官能化碳硅烷聚合物和含有它们的光致抗蚀剂组合物
- Patent Title: Functionalized carbosilane polymers and photoresist compositions containing the same
- Patent Title (中): 官能化碳硅烷聚合物和含有它们的光致抗蚀剂组合物
-
Application No.: US12057472Application Date: 2008-03-28
-
Publication No.: US07824845B2Publication Date: 2010-11-02
- Inventor: Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
- Applicant: Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/039 ; G03F7/20 ; G03F7/30
Abstract:
Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.
Public/Granted literature
- US20090081597A1 FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME Public/Granted day:2009-03-26
Information query
IPC分类:
