Invention Grant
- Patent Title: Method of manufacturing substrate, substrate manufacturing system, and method of manufacturing display
- Patent Title (中): 制造基板的方法,基板制造系统以及制造显示方法
-
Application No.: US12100234Application Date: 2008-04-09
-
Publication No.: US07824930B2Publication Date: 2010-11-02
- Inventor: Ryo Koshiishi , Hideo Kawabe , Nobuhiko Mukai , Akiko Tsutsui
- Applicant: Ryo Koshiishi , Hideo Kawabe , Nobuhiko Mukai , Akiko Tsutsui
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: K&L Gates LLP
- Priority: JP2007-104597 20070412
- Main IPC: H01L21/66
- IPC: H01L21/66

Abstract:
A method of manufacturing a substrate formed with a plurality of wiring patterns on a base, includes: a first inspection step of identifying a faulty wiring pattern having electric short circuit or disconnection by performing an electric inspection respectively for the plurality of wiring patterns; a second inspection step of examining a relative position of a defect on the base and at least one of a type and a size of the defect by an optical inspection; a matching step of matching a result of the first inspection step with a result of the second inspection step, and identifying a critical defect having electric short circuit or disconnection; and a third inspection step of examining a relative position in a pixel and an effective range of the critical defect by an optical inspection.
Public/Granted literature
- US20080254701A1 METHOD OF MANUFACTURING SUBSTRATE, SUBSTRATE MANUFACTURING SYSTEM, AND METHOD OF MANUFACTURING DISPLAY Public/Granted day:2008-10-16
Information query
IPC分类: