Invention Grant
US07825006B2 Lift-off process for GaN films formed on SiC substrates and devices fabricated using the method
有权
在SiC衬底上形成的GaN膜的剥离工艺和使用该方法制造的器件
- Patent Title: Lift-off process for GaN films formed on SiC substrates and devices fabricated using the method
- Patent Title (中): 在SiC衬底上形成的GaN膜的剥离工艺和使用该方法制造的器件
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Application No.: US10841016Application Date: 2004-05-06
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Publication No.: US07825006B2Publication Date: 2010-11-02
- Inventor: Shuji Nakamura , Steven DenBaars
- Applicant: Shuji Nakamura , Steven DenBaars
- Applicant Address: US CA Goleta
- Assignee: Cree, Inc.
- Current Assignee: Cree, Inc.
- Current Assignee Address: US CA Goleta
- Agency: Koppel, Patrick, Heybl & Dawson
- Main IPC: H01L21/30
- IPC: H01L21/30 ; H01L21/00

Abstract:
One embodiment of a method according to the present invention for fabricating a high light extraction photonic device comprises growing a lift-off layer on a substrate and growing an epitaxial semiconductor device structure on the lift-off layer such that the lift-off layer is sandwiched between said device structure and substrate. The epitaxial semiconductor structure comprises an emitter adapted to emit light in response to a bias. The device structure, lift-off layer and substrate is flip-chip mounted on a submount such that the epitaxial semiconductor device structure is sandwiched between the submount and lift-off layer. The lift-off layer is removed to separate the substrate from the device structure. Different removal methods can be used such as removal by a photo electrochemical etch or by illuminating the lift-off layer with laser light.
Public/Granted literature
- US20050247950A1 Lift-off process for GaN films formed on SiC substrates and devices fabricated using the method Public/Granted day:2005-11-10
Information query
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