Invention Grant
- Patent Title: Method of fabricating light emitting device and thus-fabricated light emitting device
- Patent Title (中): 制造发光器件和由此制造的发光器件的方法
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Application No.: US11712940Application Date: 2007-03-02
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Publication No.: US07825008B2Publication Date: 2010-11-02
- Inventor: Hitoshi Ikeda , Akio Nakamura
- Applicant: Hitoshi Ikeda , Akio Nakamura
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-061463 20060307
- Main IPC: H01L21/46
- IPC: H01L21/46

Abstract:
Aiming at providing a method of fabricating a light emitting device having an AlGaInP light emitting section, less causative of crack by cleavage, on the edge portions on the back surface of the device chip in process of dicing or breaking, a light emitting device wafer is diced along a dicing line inclined at an angle of 15° to 30°, both ends inclusive, away from a dicing line angle reference direction defined as the direction on the (100) main surface.
Public/Granted literature
- US20070210327A1 Method of fabricating light emitting device and thus-fabricated light emitting device Public/Granted day:2007-09-13
Information query
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