Invention Grant
- Patent Title: Method of synthesizing silicon wires
- Patent Title (中): 硅丝合成方法
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Application No.: US11525440Application Date: 2006-09-22
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Publication No.: US07825036B2Publication Date: 2010-11-02
- Inventor: Yuan Yao , Li-Guo Xu , Shou-Shan Fan
- Applicant: Yuan Yao , Li-Guo Xu , Shou-Shan Fan
- Applicant Address: CN Beijing TW Tu-Cheng, Taipei Hsien
- Assignee: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- Current Assignee: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- Current Assignee Address: CN Beijing TW Tu-Cheng, Taipei Hsien
- Agent Jeffrey T. Knapp
- Priority: CN200610032947 20060114
- Main IPC: H01L21/469
- IPC: H01L21/469

Abstract:
A method of synthesizing silicon wires generally includes the steps of: providing a substrate; forming a copper catalyst particle layer on a top surface of the substrate; heating the reactive device at a temperature of above 450° C. in a flowing protective gas; and introducing a mixture of a protective gas and a silicon-based reactive gas at a temperature of above 450° C. at a pressure of below 700 Torr, thereby forming the silicon wires on the substrate.
Public/Granted literature
- US20070166899A1 Method of synthesizing silicon wires Public/Granted day:2007-07-19
Information query
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