Invention Grant
- Patent Title: Fabrication of enclosed nanochannels using silica nanoparticles
- Patent Title (中): 使用二氧化硅纳米粒子制造封闭的纳米通道
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Application No.: US11549732Application Date: 2006-10-16
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Publication No.: US07825037B2Publication Date: 2010-11-02
- Inventor: Steven R. J. Brueck , Deying Xia
- Applicant: Steven R. J. Brueck , Deying Xia
- Applicant Address: US NM Albuquerque
- Assignee: STC.UNM
- Current Assignee: STC.UNM
- Current Assignee Address: US NM Albuquerque
- Agency: MH2 Technology Law Group LLP
- Main IPC: H01L21/31
- IPC: H01L21/31 ; H01L21/469
Abstract:
In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using interferometric lithography. The method can further include depositing a plurality of silica nanoparticles to form a structure over the pattern and removing the pattern while retaining the structure formed by the plurality of silica nanoparticles, wherein the structure comprises an enclosed nanochannel.
Public/Granted literature
- US20070134939A1 FABRICATION OF ENCLOSED NANOCHANNELS USING SILICA NANOPARTICLES Public/Granted day:2007-06-14
Information query
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