Invention Grant
US07825079B2 Cleaning composition comprising a chelant and quaternary ammonium hydroxide mixture
有权
包含螯合剂和季铵氢氧化物混合物的清洁组合物
- Patent Title: Cleaning composition comprising a chelant and quaternary ammonium hydroxide mixture
- Patent Title (中): 包含螯合剂和季铵氢氧化物混合物的清洁组合物
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Application No.: US12463645Application Date: 2009-05-11
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Publication No.: US07825079B2Publication Date: 2010-11-02
- Inventor: Tomoco Suzuki , Atsushi Otake
- Applicant: Tomoco Suzuki , Atsushi Otake
- Applicant Address: US CA Hayward
- Assignee: EKC Technology, Inc.
- Current Assignee: EKC Technology, Inc.
- Current Assignee Address: US CA Hayward
- Agency: Dunlap Codding, P.C.
- Main IPC: C11D3/30
- IPC: C11D3/30 ; C11D7/06

Abstract:
The invention relates to compositions and methods for cleaning integrated circuit substrates. The compositions are in the form of an aqueous solution and include a quaternary ammonium hydroxide compound and a chelating compound. The chelating compound includes either boric acid or at least one N-substituted aminocarboxylate selected from the group consisting of N-bis(2-hydroxyethyl)glycine(bicine), N-tris(hydroxymethyl)methyl glycine (tricine) and mixtures thereof, and can optionally include glycine, Iminodiacetic acid (IDA), Nitrilo trizacetic acid (NTA), Ethylenediammine Tetraacetic acid (EDTA), or mixtures thereof.
Public/Granted literature
- US20090281017A1 Cleaning Composition Public/Granted day:2009-11-12
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