Invention Grant
US07825082B2 Highly protonated, supercharged, low pH, non-corrosive composition
有权
高质子化，增压，低pH，非腐蚀性组成
- Patent Title: Highly protonated, supercharged, low pH, non-corrosive composition
- Patent Title (中): 高质子化，增压，低pH，非腐蚀性组成
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Application No.: US12171382Application Date: 2008-07-11
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Publication No.: US07825082B2Publication Date: 2010-11-02
- Inventor: Anthony P. Sakovich , Burt R. Sookram
- Applicant: Anthony P. Sakovich , Burt R. Sookram
- Applicant Address: US FL Palm Harbor
- Assignee: S&B Worldwide Corporation
- Current Assignee: S&B Worldwide Corporation
- Current Assignee Address: US FL Palm Harbor
- Agent Dennis G. LaPointe
- Main IPC: C11D3/02
- IPC: C11D3/02 ; C11D7/02 ; C11D3/20 ; C11D1/22 ; A01K43/00 ; A61K8/00 ; A61K33/04 ; A61Q1/14 ; A61Q19/00 ; A61Q19/10 ; C07C323/25 ; A01N59/02
Abstract:
A highly protonated, supercharged, low pH, non-corrosive composition and process for making the composition wherein the composition has a milli-volt charge between 400 and 1400, a proton count between 8×10^24 and 14×10^24, and a pH level at 1 part composition with 99 parts water between 0.9 and 1.8.
Public/Granted literature
- US20100006804A1 HIGHLY PROTONATED, SUPERCHARGED, LOW PH, NON-CORROSIVE COMPOSITION Public/Granted day:2010-01-14
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