Invention Grant
US07825390B2 Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus
有权
具有等离子体辐射源的装置和形成辐射束和光刻设备的方法
- Patent Title: Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus
- Patent Title (中): 具有等离子体辐射源的装置和形成辐射束和光刻设备的方法
-
Application No.: US11705822Application Date: 2007-02-14
-
Publication No.: US07825390B2Publication Date: 2010-11-02
- Inventor: Vladimir Mihallovitch Krivtsun , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Evgeny Dmitrievich Korop , Konstantin Nikolaevich Koshelev , Yurii Victorovitch Sidelnikov , Oleg Yakushev
- Applicant: Vladimir Mihallovitch Krivtsun , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Evgeny Dmitrievich Korop , Konstantin Nikolaevich Koshelev , Yurii Victorovitch Sidelnikov , Oleg Yakushev
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42

Abstract:
An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.
Public/Granted literature
Information query