Invention Grant
- Patent Title: GaN crystal substrate
- Patent Title (中): GaN晶体衬底
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Application No.: US11730649Application Date: 2007-04-03
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Publication No.: US07825409B2Publication Date: 2010-11-02
- Inventor: Shunsuke Fujita , Hitoshi Kasai
- Applicant: Shunsuke Fujita , Hitoshi Kasai
- Applicant Address: JP Osaka
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-102158 20060403; JP2007-024377 20070202
- Main IPC: H01L23/58
- IPC: H01L23/58

Abstract:
A GaN crystal substrate has a crystal growth surface on which a crystal is grown, and a rear surface opposite to the crystal growth surface. The crystal growth surface has a roughness Ra(C)of at most 10 nm, and the rear surface has a roughness Ra(R) of at least 0.5 μm and at most 10 μm. A ratio Ra(R)/Ra(C) of the surface roughness Ra(R) to the surface roughness Ra(C) is at least 50. Thus, a GaN crystal substrate of which front and rear surfaces are distinguishable from each other is provided, without impairing the morphology of a semiconductor layer grown on the GaN crystal substrate.
Public/Granted literature
- US20070228400A1 GaN crystal substrate Public/Granted day:2007-10-04
Information query
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