Invention Grant
- Patent Title: Diode-like composite semiconductor device
- Patent Title (中): 二极管状复合半导体器件
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Application No.: US12015067Application Date: 2008-01-16
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Publication No.: US07825435B2Publication Date: 2010-11-02
- Inventor: Osamu Machida , Akio Iwabuchi
- Applicant: Osamu Machida , Akio Iwabuchi
- Applicant Address: JP
- Assignee: Sanken Electric Co., Ltd.
- Current Assignee: Sanken Electric Co., Ltd.
- Current Assignee Address: JP
- Agency: Woodcock Washburn LLP
- Priority: JP2007-031103 20070209
- Main IPC: H01L29/80
- IPC: H01L29/80

Abstract:
A silicon-made low-forward-voltage Schottky barrier diode is serially combined with a high-antivoltage-strength high-electron-mobility transistor made from a nitride semiconductor that is wider in bandgap than silicon. The Schottky barrier diode has its anode connected to the gate, and its cathode to the source, of the HEMT. This HEMT is normally on. The reverse voltage withstanding capability of the complete device depends upon that between the drain and gate of the HEMT.
Public/Granted literature
- US20080191216A1 Diode-Like Composite Semiconductor Device Public/Granted day:2008-08-14
Information query
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