Invention Grant
US07825438B2 CMOS image sensor having drive transistor with increased gate surface area and method of manufacturing the same 有权
CMOS图像传感器具有增加的栅表面面积的驱动晶体管及其制造方法

CMOS image sensor having drive transistor with increased gate surface area and method of manufacturing the same
Abstract:
A CMOS image sensor cell includes a semiconductor active region of first conductivity type having a surface thereon and a P-N junction photodiode in the active region. A drive transistor is also provided in the semiconductor active region. The drive transistor has a gate electrode that is configured to receive charge generated in the P-N junction photodiode during an image capture operation (i.e., during capture of photons received from an image). This drive transistor has a gate electrode and a contoured channel region extending underneath the gate electrode. The contoured channel region has an effective channel length greater than a length of the gate electrode.
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