Invention Grant
US07825438B2 CMOS image sensor having drive transistor with increased gate surface area and method of manufacturing the same
有权
CMOS图像传感器具有增加的栅表面面积的驱动晶体管及其制造方法
- Patent Title: CMOS image sensor having drive transistor with increased gate surface area and method of manufacturing the same
- Patent Title (中): CMOS图像传感器具有增加的栅表面面积的驱动晶体管及其制造方法
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Application No.: US11463317Application Date: 2006-08-09
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Publication No.: US07825438B2Publication Date: 2010-11-02
- Inventor: Jong-wan Jung , Duck-hyung Lee
- Applicant: Jong-wan Jung , Duck-hyung Lee
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec
- Priority: KR10-2005-0072997 20050809
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
A CMOS image sensor cell includes a semiconductor active region of first conductivity type having a surface thereon and a P-N junction photodiode in the active region. A drive transistor is also provided in the semiconductor active region. The drive transistor has a gate electrode that is configured to receive charge generated in the P-N junction photodiode during an image capture operation (i.e., during capture of photons received from an image). This drive transistor has a gate electrode and a contoured channel region extending underneath the gate electrode. The contoured channel region has an effective channel length greater than a length of the gate electrode.
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