Invention Grant
- Patent Title: MOS capacitor and semiconductor device
- Patent Title (中): MOS电容器和半导体器件
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Application No.: US11547904Application Date: 2005-04-21
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Publication No.: US07825447B2Publication Date: 2010-11-02
- Inventor: Kiyoshi Kato , Yutaka Shionoiri
- Applicant: Kiyoshi Kato , Yutaka Shionoiri
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2004-132813 20040428
- International Application: PCT/JP2005/008087 WO 20050421
- International Announcement: WO2005/106961 WO 20051110
- Main IPC: H01L29/94
- IPC: H01L29/94

Abstract:
A capacitor capable of functioning as a capacitor even when an AC voltage is applied thereto is provided without increasing the manufacturing steps of a semiconductor device. A transistor is used as a MOS capacitor where a pair of impurity regions formed on opposite sides of a channel formation region are each doped with impurities of different conductivity so as to be used as a source region or a drain region. Specifically, assuming that an impurity region that is doped with N-type impurities is referred to as an N-type region while an impurity region that is doped with P-type impurities is referred to as a P-type region, a transistor is provided where a channel formation region is interposed between the N-type region and the P-type region, which is used as a MOS capacitor.
Public/Granted literature
- US20070210364A1 Mos Capacitor And Semiconductor Device Public/Granted day:2007-09-13
Information query
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