Invention Grant
- Patent Title: Memory cell with buried digit line
- Patent Title (中): 具有埋地数字线的存储单元
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Application No.: US11829618Application Date: 2007-07-27
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Publication No.: US07825452B2Publication Date: 2010-11-02
- Inventor: Anton P. Eppich
- Applicant: Anton P. Eppich
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: H01L27/108
- IPC: H01L27/108

Abstract:
A memory cell, array and device include an active area formed in a substrate with a vertical transistor including a first end disposed over a first portion of the active area. The vertical transistor is formed as an epitaxial post on the substrate surfaces extends from the surface of the substrate, and includes a gate formed around a perimeter of the epitaxial post. A capacitor is formed on the vertical transistor and a buried digit line vertically couples to a second portion of the active area. An electronic system and method for forming a memory cell are also disclosed.
Public/Granted literature
- US20080017905A1 MEMORY CELL WITH BURIED DIGIT LINE Public/Granted day:2008-01-24
Information query
IPC分类: