Invention Grant
- Patent Title: Nonvolatile semiconductor memory and manufacturing method thereof
- Patent Title (中): 非易失性半导体存储器及其制造方法
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Application No.: US12050427Application Date: 2008-03-18
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Publication No.: US07825458B2Publication Date: 2010-11-02
- Inventor: Tatsuo Shimizu , Koichi Muraoka , Masato Koyama , Shoko Kikuchi
- Applicant: Tatsuo Shimizu , Koichi Muraoka , Masato Koyama , Shoko Kikuchi
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-085705 20070328
- Main IPC: H01L29/792
- IPC: H01L29/792

Abstract:
A nonvolatile semiconductor memory includes a source area and a drain area provided on a semiconductor substrate with a gap which serves as a channel area, a first insulating layer, a charge accumulating layer, a second insulating layer (block layer) and a control electrode, formed successively on the channel area, and the second insulating layer is formed by adding an appropriate amount of high valence substance into base material composed of substance having a sufficiently higher dielectric constant than the first insulating layer so as to accumulate a large amount of negative charges in the block layer by localized state capable of trapping electrons, so that the high dielectric constant of the block layer and the high electronic barrier are achieved at the same time.
Public/Granted literature
- US20080237699A1 NONVOLATILE SEMICONDUCTOR MEMORY AND MANUFACTURING METHOD THEREOF Public/Granted day:2008-10-02
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