Invention Grant
US07825465B2 Structure and method for forming field effect transistor with low resistance channel region
有权
用于形成具有低电阻通道区域的场效应晶体管的结构和方法
- Patent Title: Structure and method for forming field effect transistor with low resistance channel region
- Patent Title (中): 用于形成具有低电阻通道区域的场效应晶体管的结构和方法
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Application No.: US12330273Application Date: 2008-12-08
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Publication No.: US07825465B2Publication Date: 2010-11-02
- Inventor: James Pan , Qi Wang
- Applicant: James Pan , Qi Wang
- Applicant Address: US ME South Portland
- Assignee: Fairchild Semiconductor Corporation
- Current Assignee: Fairchild Semiconductor Corporation
- Current Assignee Address: US ME South Portland
- Agency: Townsend and Townsend and Crew LLP
- Main IPC: H01L29/78
- IPC: H01L29/78

Abstract:
A trench-gate field effect transistor includes trenches extending into a silicon region of a first conductivity type, and a gate electrodes in each trench. Body regions of second conductivity type extend over the silicon region between adjacent trenches. Each body region forms a first PN junction with the silicon region, and each body region includes a silicon-germanium layer of the second conductivity type laterally extending between adjacent trenches. Source regions of the first conductivity flank the trenches, and each source region forms a second PN junction with one of the body regions. Channel regions extend in the body regions along sidewalls of the trenches between the source regions and a bottom surface of the body regions. The silicon-germanium layers extend into corresponding channel regions to thereby reduce the channel resistance.
Public/Granted literature
- US20090194811A1 Structure and Method for Forming Field Effect Transistor with Low Resistance Channel Region Public/Granted day:2009-08-06
Information query
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