Invention Grant
US07825466B2 Super-junction semiconductor element and method of fabricating the same 有权
超结半导体元件及其制造方法

Super-junction semiconductor element and method of fabricating the same
Abstract:
The present invention provides a super-junction semiconductor element having a high voltage resistance and a low resistivity, while being successfully reduced in the size thereof, which comprises a semiconductor substrate 3; a pair of electrodes 1, 2 provided respectively on a top surface 12 and a back surface 13 of the semiconductor substrate 3; a parallel pn layer provided between the top surface 12 and the back surface 13 of said semiconductor substrate, having n-type semiconductor layers 4 allowing current flow under the ON state but being depleted under the OFF state, and p-type semiconductor layers 5 alternately arranged therein; and an insulating film 6 formed so as to surround the parallel pn layer; wherein the insulating film 6 is formed at a predetermined position.
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