Invention Grant
- Patent Title: MEMS sensor and production method of MEMS sensor
- Patent Title (中): MEMS传感器和MEMS传感器的生产方法
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Application No.: US12219449Application Date: 2008-07-22
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Publication No.: US07825483B2Publication Date: 2010-11-02
- Inventor: Goro Nakatani , Mizuho Okada , Nobuhisa Yamashita
- Applicant: Goro Nakatani , Mizuho Okada , Nobuhisa Yamashita
- Applicant Address: JP Kyoto
- Assignee: Rohm Co., Ltd.
- Current Assignee: Rohm Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Rabin & Berdo, PC
- Priority: JP2007-192204 20070724
- Main IPC: H01L29/78
- IPC: H01L29/78
Abstract:
An MEMS sensor of the present invention includes a substrate, a lower thin film provided on a surface of the substrate, an upper thin film opposed to the lower thin film at an interval on the side opposite to the substrate, and a wall portion surrounding the lower thin film and the upper thin film and protruding on the side opposite to the lower thin film with respect to the upper thin film.
Public/Granted literature
- US20090047479A1 Mems sensor and production method of mems sensor Public/Granted day:2009-02-19
Information query
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