Invention Grant
US07825496B2 Semiconductor device having a filling pattern around a storage structure and method of forming the same
失效
具有围绕存储结构的填充图案的半导体器件及其形成方法
- Patent Title: Semiconductor device having a filling pattern around a storage structure and method of forming the same
- Patent Title (中): 具有围绕存储结构的填充图案的半导体器件及其形成方法
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Application No.: US12292673Application Date: 2008-11-24
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Publication No.: US07825496B2Publication Date: 2010-11-02
- Inventor: Jong-Wan Ma , Joon-Mo Kwon
- Applicant: Jong-Wan Ma , Joon-Mo Kwon
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2007-0120185 20071123
- Main IPC: H01L29/06
- IPC: H01L29/06

Abstract:
A semiconductor device includes an interlayer insulating layer on a semiconductor substrate, at least one plug on the semiconductor substrate, the plug extending through the interlayer insulating layer toward an upper portion of the semiconductor substrate, the plug having a lower part with a first diameter and an upper part with a second diameter different from the first diameter, a filling pattern on the interlayer insulating layer, the filling pattern surrounding the upper part of the plug, and an upper surface of the filling pattern being substantially coplanar with an upper surface of the plug, the upper surface of the plug facing away from the semiconductor substrate, and a protection pattern on the upper part of the plug, the protection pattern being between the plug, the filling pattern, and the interlayer insulating layer.
Public/Granted literature
- US20090134525A1 Semiconductor device having a filling pattern around a storage structure and method of forming the same Public/Granted day:2009-05-28
Information query
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