Invention Grant
- Patent Title: Dielectric film and layer testing
- Patent Title (中): 电介质膜和层测试
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Application No.: US12418843Application Date: 2009-04-06
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Publication No.: US07825679B2Publication Date: 2010-11-02
- Inventor: Andreas Martin , Karl-Henrik Rydén , Andrea Mitchell
- Applicant: Andreas Martin , Karl-Henrik Rydén , Andrea Mitchell
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: G01R31/02
- IPC: G01R31/02

Abstract:
A system for testing and a method for making a semiconductor device is disclosed. A preferred embodiment includes a conductor overlying a dielectric layer. The conductor is coupled to a first test pad via a first conducting line and to a second test pad via a second conducting line.
Public/Granted literature
- US20100253380A1 DIELECTRIC FILM AND LAYER TESTING Public/Granted day:2010-10-07
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