Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US11516734Application Date: 2006-09-07
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Publication No.: US07826030B2Publication Date: 2010-11-02
- Inventor: Johannes Catharinus Hubertus Mulkens
- Applicant: Johannes Catharinus Hubertus Mulkens
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42 ; G03B27/58 ; G03B27/32
Abstract:
A system to recycle immersion fluid in an immersion fluid lithographic apparatus is described. A recycling path comprising a plurality of parallel paths, each of which has its own parallel liquid treatment unit optimized to treat fluid which is directed through it, is disclosed.
Public/Granted literature
- US20080062393A1 Lithographic apparatus and device manufacturing method Public/Granted day:2008-03-13
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