Invention Grant
- Patent Title: Circulation system for high refractive index liquid in pattern forming apparatus
- Patent Title (中): 图案形成装置中高折射率液体的循环系统
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Application No.: US11778412Application Date: 2007-07-16
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Publication No.: US07826032B2Publication Date: 2010-11-02
- Inventor: Taro Yamamoto , Hitoshi Kosugi , Yoshiaki Yamada , Yasuhito Saiga
- Applicant: Taro Yamamoto , Hitoshi Kosugi , Yoshiaki Yamada , Yasuhito Saiga
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-196140 20060718
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G21K5/10
Abstract:
A circulation system for a high refractive index liquid includes a first collecting section configured to collect a high refractive index liquid used in an immersion light exposure section; a first supply section configured to supply the high refractive index liquid collected in the first collecting section to a cleaning section as a cleaning liquid; a second collecting section configured to collect the high refractive index liquid used in the cleaning section; and a second supply section configured to supply the high refractive index liquid collected in the second collecting section to the immersion light exposure section, wherein the high refractive index liquid is circulated between the immersion light exposure section and the cleaning section.
Public/Granted literature
- US20080018868A1 CIRCULATION SYSTEM FOR HIGH REFRACTIVE INDEX LIQUID IN PATTERN FORMING APPARATUS Public/Granted day:2008-01-24
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