Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US11725499Application Date: 2007-03-20
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Publication No.: US07826035B2Publication Date: 2010-11-02
- Inventor: Arno Jan Bleeker
- Applicant: Arno Jan Bleeker
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP03257056 20031107
- Main IPC: G03B27/54
- IPC: G03B27/54

Abstract:
An array of individually controllable elements includes elements, each formed of a stack of layers of dielectric material. At least one layer is an electro-optical material. The at least one layer's refractive index for radiation that is plane polarized in a given direction can be changed by application of a voltage in order to change the reflection/transmission characteristic of the boundary between this layer and the adjacent layer.
Public/Granted literature
- US20070165203A1 Lithographic apparatus and device manufacturing method Public/Granted day:2007-07-19
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