Invention Grant
- Patent Title: Scanning exposure apparatus and method of manufacturing device
- Patent Title (中): 扫描曝光装置及其制造方法
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Application No.: US12326391Application Date: 2008-12-02
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Publication No.: US07826036B2Publication Date: 2010-11-02
- Inventor: Takashi Sukegawa
- Applicant: Takashi Sukegawa
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc., IP Division
- Priority: JP2007-316358 20071206
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/72

Abstract:
A scanning exposure apparatus according to this invention has a light source which can change the central wavelength of exposure light to undergo pulsed oscillation, and scan-exposes a substrate with slit-like exposure light while periodically changing the central wavelength in synchronism with the pulsed oscillation of the exposure light. The scanning exposure apparatus includes a controller which controls the light source so that integrated values Sws and Swl obtained by integrating the intensity of the exposure light for each wavelength in the scanning direction in a short-wavelength range and long-wavelength range, respectively, assuming a target central wavelength as a reference satisfy: |(Sws−Swl)/(Sws +Swl)|≦0.1.
Public/Granted literature
- US20090147231A1 SCANNING EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE Public/Granted day:2009-06-11
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