Invention Grant
US07826038B2 Method for adjusting lithographic mask flatness using thermally induced pellicle stress
有权
使用热诱导防护薄膜应力调整光刻胶片平整度的方法
- Patent Title: Method for adjusting lithographic mask flatness using thermally induced pellicle stress
- Patent Title (中): 使用热诱导防护薄膜应力调整光刻胶片平整度的方法
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Application No.: US12029506Application Date: 2008-02-12
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Publication No.: US07826038B2Publication Date: 2010-11-02
- Inventor: Emily F. Gallagher , Louis M. Kindt , James A. Slinkman , Richard E. Wistron
- Applicant: Emily F. Gallagher , Louis M. Kindt , James A. Slinkman , Richard E. Wistron
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Richard Kotulak
- Main IPC: G03B27/62
- IPC: G03B27/62 ; G03F9/00
Abstract:
A method for adjusting the flatness of a lithographic mask includes determining an initial mask flatness of the mask, determining an applied stress for bringing the mask to a desired mask flatness, and determining a mounting temperature of a pellicle frame to be mounted to the mask, the mounting temperature corresponding to the applied stress. The actual temperature of the pellicle frame is adjusted to the determined mounting temperature, and the pellicle frame is mounted to the mask at the mounting temperature.
Public/Granted literature
- US20080131795A1 METHOD FOR ADJUSTING LITHOGRAPHIC MASK FLATNESS USING THERMALLY INDUCED PELLICLE STRESS Public/Granted day:2008-06-05
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