Invention Grant
US07826044B2 Measurement method and apparatus, and exposure apparatus 有权
测量方法和装置以及曝光装置

Measurement method and apparatus, and exposure apparatus
Abstract:
A measurement method for measuring an optical characteristic of a target optical system includes the steps of introducing a light from each of plural patterns that reduce diffracted lights other than a predetermined order, to a different position on a pupil plane of the target optical system, the introducing step including the step of scanning the light in a radial direction in the pupil plane of the target optical system, detecting a imaging position of the light introduced by the introducing step, on an image plane of the target optical system, and obtaining the optical characteristic of the target optical system based on a detection result of the detecting step.
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