Invention Grant
- Patent Title: Measurement method and apparatus, and exposure apparatus
- Patent Title (中): 测量方法和装置以及曝光装置
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Application No.: US11466848Application Date: 2006-08-24
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Publication No.: US07826044B2Publication Date: 2010-11-02
- Inventor: Yoshihiro Shiode
- Applicant: Yoshihiro Shiode
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2005-246951 20050829
- Main IPC: G01B9/00
- IPC: G01B9/00

Abstract:
A measurement method for measuring an optical characteristic of a target optical system includes the steps of introducing a light from each of plural patterns that reduce diffracted lights other than a predetermined order, to a different position on a pupil plane of the target optical system, the introducing step including the step of scanning the light in a radial direction in the pupil plane of the target optical system, detecting a imaging position of the light introduced by the introducing step, on an image plane of the target optical system, and obtaining the optical characteristic of the target optical system based on a detection result of the detecting step.
Public/Granted literature
- US20070046929A1 MEASUREMENT METHOD AND APPARATUS, AND EXPOSURE APPARATUS Public/Granted day:2007-03-01
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