Invention Grant
- Patent Title: Semiconductor laser device including highly reflective coating film
- Patent Title (中): 半导体激光器件包括高反射涂膜
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Application No.: US12022194Application Date: 2008-01-30
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Publication No.: US07826507B2Publication Date: 2010-11-02
- Inventor: Harumi Nishiguchi , Hiromasu Matsuoka , Yasuyuki Nakagawa , Yasuhiro Kunitsugu
- Applicant: Harumi Nishiguchi , Hiromasu Matsuoka , Yasuyuki Nakagawa , Yasuhiro Kunitsugu
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: JP2007-121055 20070501
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A semiconductor light-emitting device includes a light generation unit generating light with an oscillation wavelength λ, a light outgoing facet from which light generated at the light generation unit emerges, a light reflecting facet at which light generated at the light generation unit is reflected, and a high reflection film at the light reflecting facet and made of a dielectric multilayered film of at least three layers. The high reflection film includes a first layer which is in contact with the light reflection facet, is constituted of Al2O3, and has a thickness smaller than λ/4n, wherein n is the refractive index of Al2O3, a second layer which is in contact with the first layer, and a third layer which is in contact with the second layer and has a refractive index different from the refractive index of the second layer.
Public/Granted literature
- US20080273556A1 SEMICONDUCTOR LIGHT-EMITTING DEVICE Public/Granted day:2008-11-06
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