Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method utilizing a multiple dictionary compression method for FPD
- Patent Title (中): 利用FPD的多字典压缩方法的平版印刷设备和器件制造方法
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Application No.: US12554083Application Date: 2009-09-04
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Publication No.: US07826672B2Publication Date: 2010-11-02
- Inventor: Lambertus Gerardus Maria Kessels , Patricius Aloysius Jacobus Tinnemans , Remco Johannes Van Engelen
- Applicant: Lambertus Gerardus Maria Kessels , Patricius Aloysius Jacobus Tinnemans , Remco Johannes Van Engelen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G06K9/46
- IPC: G06K9/46 ; H04N1/32 ; H03M7/00

Abstract:
A system is provided that includes a device having an emissive portion, a memory, and a dictionary decompressor. The device having an emissive portion is configured to produce a patterned beam. The memory is configured to store a compressed representation of a requested dose pattern, comprising two groups of repeating pattern features, to be formed on a surface by the patterned beam. The dictionary decompressor at least partially decompresses the compressed representation. The dictionary decompressor comprises a first dictionary memory configured to store pattern data corresponding to a first group of the two groups of repeating pattern features and a second dictionary memory configured to store pattern data corresponding to a second group of the two groups of repeating pattern features. The repeating pattern features in the first group have one or more differing characteristics than the repeating pattern features in the second group. Related methods are also provided.
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