Invention Grant
- Patent Title: Mask fitting system and method
- Patent Title (中): 面罩配合系统及方法
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Application No.: US10556461Application Date: 2005-06-06
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Publication No.: US07827038B2Publication Date: 2010-11-02
- Inventor: Ron Richard , Sophear Su , Gary Christopher Robinson , Philip Rodney Kwok , John Michael Kelly , Andrew Martin Price , Ivan John Vuletich , Karthikeyan Selvarjan
- Applicant: Ron Richard , Sophear Su , Gary Christopher Robinson , Philip Rodney Kwok , John Michael Kelly , Andrew Martin Price , Ivan John Vuletich , Karthikeyan Selvarjan
- Applicant Address: AU Bella Vista, New South Wales
- Assignee: ResMed Limited
- Current Assignee: ResMed Limited
- Current Assignee Address: AU Bella Vista, New South Wales
- Agency: Nixon & Vanderhye P.C.
- International Application: PCT/AU2005/000810 WO 20050606
- International Announcement: WO2005/118041 WO 20051215
- Main IPC: G06Q10/00
- IPC: G06Q10/00 ; G06Q50/00

Abstract:
A mask fitting system (1) for selecting a mask system for a patient includes at least one terminal (6) which receives data unique to a patient. The patient data can be scanned in using a scanner, such as a handheld or 3-D scanner, or the relevant dimensions of the patient can be simply input into the terminal. A database (2) is provided to store mask system data relating to a plurality of potential mask system solutions for the patient. A communication channel (4) is provided by which the data received by the terminal can be compared with mask system data stored in a mask system database, so as to generate a best-fit mask system result. The best-fit result may include one or more mask system recommendations for the patient.
Public/Granted literature
- US20060235877A1 Mask fititng system and method Public/Granted day:2006-10-19
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