Invention Grant
- Patent Title: Incrementally resolved phase-shift conflicts in layouts for phase-shifted features
- Patent Title (中): 针对相移特征的布局中增量解析相移冲突
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Application No.: US11766047Application Date: 2007-06-20
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Publication No.: US07827518B2Publication Date: 2010-11-02
- Inventor: Shao-Po Wu , Yao-Ting Wang
- Applicant: Shao-Po Wu , Yao-Ting Wang
- Applicant Address: US CA Mountain View
- Assignee: Synopsys, Inc.
- Current Assignee: Synopsys, Inc.
- Current Assignee Address: US CA Mountain View
- Agency: Bever, Hoffman & Harms, LLP
- Agent Jeanette S. Harms
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
Phase shifting allows generating very narrow features in a printed features layer. Thus, forming a fabrication layout for a physical design layout having critical features typically includes providing a layout for shifters. Specifically, pairs of shifters can be placed to define critical features, wherein the pairs of shifters conform to predetermined design rules. After placement, phase information for the shifters associated with the set of critical features can be assigned. Complex designs can lead to phase-shift conflicts among shifters in the fabrication layout. An irresolvable conflict can be passed to the design process earlier than in a conventional processes, thereby saving valuable time in the fabrication process for printed circuits.
Public/Granted literature
- US20070245291A1 Incrementally Resolved Phase-Shift Conflicts In Layouts For Phase-Shifted Features Public/Granted day:2007-10-18
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