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发明授权
US07827824B2 Synthetic quartz glass substrate for excimer lasers and making method 有权
用于准分子激光器的合成石英玻璃基板和制造方法

Synthetic quartz glass substrate for excimer lasers and making method
摘要：
A synthetic quartz glass substrate having (i) an OH concentration of 1-100 ppm and a hydrogen molecule concentration of 1×1016-1×1019 molecules/cm3, (ii) an in-plane variation of its internal transmission at wavelength 193.4 nm which is up to 0.2%, and (iii) an internal transmission of at least 99.6% at wavelength 193.4 nm is suited for use with excimer lasers.
摘要（中）：

（i）OH浓度为1-100ppm，氢分子浓度为1×1016-1×1019分子/ cm3的合成石英玻璃基板，（ii）其波长为193.4nm的内部透光率的面内变化 其高达0.2％，和（iii）在波长193.4nm处的至少99.6％的内部透射率适用于准分子激光器。

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