发明授权
US07829650B2 Polymer for organic anti-reflective coating layer and composition including the same
失效
用于有机抗反射涂层的聚合物及包含其的组合物
- 专利标题： Polymer for organic anti-reflective coating layer and composition including the same
- 专利标题（中）： 用于有机抗反射涂层的聚合物及包含其的组合物
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申请号： US11952324申请日： 2007-12-07
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公开(公告)号： US07829650B2公开(公告)日： 2010-11-09
- 发明人: Sang-Jeoung Kim , Hyo-Jung Roh , Jong-Kyoung Park , Jeong-Sik Kim , Hyun-Jin Kim , Jae-Hyun Kim
- 申请人： Sang-Jeoung Kim , Hyo-Jung Roh , Jong-Kyoung Park , Jeong-Sik Kim , Hyun-Jin Kim , Jae-Hyun Kim
- 申请人地址： KR Incheon
- 专利权人： Dongjin Semichem Co., Ltd.
- 当前专利权人： Dongjin Semichem Co., Ltd.
- 当前专利权人地址： KR Incheon
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： KR10-2006-0132668 20061222
- 主分类号： G03F7/11
- IPC分类号： G03F7/11 ; C08G77/00
摘要：
A polymer which has siloxane group at a main chain thereof and a composition including the same, for forming an organic anti-reflective coating layer are disclosed. The polymer for forming an organic anti-reflective coating layer is represented by following Formula. In Formula, R is hydrogen atom, C1˜C20 alkyl group, C1˜C10 alcohol group or epoxy group, R1 is independently hydrogen atom, n is an integer of 1-50, R2 is C1˜C20 alkyl group, C3˜C20 cycloalkyl group, C6˜C20 aryl group or C7˜C12 arylalkyl group, R3 is hydrogen atom, C1˜C10 alcohol group or epoxy group and POSS is a polyhedral oligosilsesquioxane.
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