发明授权
- 专利标题： Coating structure with an anti-reflection function and an anti-electromagnetic wave function
- 专利标题（中）： 涂层结构具有抗反射功能和抗电磁波功能
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申请号： US12007063申请日： 2008-01-07
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公开(公告)号： US07833628B2公开(公告)日： 2010-11-16
- 发明人: Cheng-Chieh Chang , Shiu-Feng Liu , Pi-Jui Kuo
- 申请人： Cheng-Chieh Chang , Shiu-Feng Liu , Pi-Jui Kuo
- 申请人地址： TW Hsinchu
- 专利权人： Innovation & Infinigy Global Corp.
- 当前专利权人： Innovation & Infinigy Global Corp.
- 当前专利权人地址： TW Hsinchu
- 代理机构： Rosenberg, Klein & Lee
- 主分类号： B32B7/00
- IPC分类号： B32B7/00 ; B32B15/00
摘要：
A coating structure with an anti-reflection function and an anti-electromagnetic wave function, including an anti-reflection coating structure, an anti-electromagnetic wave coating structure, a third transparent substrate, and two adhesive layers respectively disposed between the anti-reflection coating structure and the third transparent substrate and between the third transparent substrate and the anti-electromagnetic wave coating structure. The anti-reflection coating structure has a first transparent substrate and an anti-reflection coating module formed on the first transparent substrate. The anti-electromagnetic wave coating structure has a second transparent substrate and an anti-electromagnetic wave coating module formed on the second transparent substrate. The third transparent substrate is disposed between the anti-reflection coating structure and the anti-electromagnetic wave coating structure.
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