发明授权
- 专利标题: Technique for forming an isolation trench as a stress source for strain engineering
- 专利标题(中): 形成隔离沟槽作为应变工程应力源的技术
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申请号: US11534726申请日: 2006-09-25
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公开(公告)号: US07833874B2公开(公告)日: 2010-11-16
- 发明人: Kai Frohberg , Patrick Press , Thomas Werner
- 申请人: Kai Frohberg , Patrick Press , Thomas Werner
- 申请人地址: KY Grand Cayman
- 专利权人: Globalfoundries Inc.
- 当前专利权人: Globalfoundries Inc.
- 当前专利权人地址: KY Grand Cayman
- 代理机构: Williams, Morgan & Amerson, P.C.
- 优先权: DE102005063108 20051230
- 主分类号: H01L21/76
- IPC分类号: H01L21/76
摘要:
By forming a non-oxidizable liner in an isolation trench and selectively modifying the liner within the isolation trench, the stress characteristics of the isolation trench may be adjusted. In one embodiment, a high compressive stress may be obtained by treating the liner with an ion bombardment and subsequently exposing the device to an oxidizing ambient at elevated temperatures, thereby incorporating silicon dioxide into the non-oxidizable material. Hence, an increased compressive stress may be generated within the non-oxidizable layer.
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