发明授权
US07834326B2 Aberration corrector and charged particle beam apparatus using the same
有权
畸变校正器和使用其的带电粒子束装置
- 专利标题： Aberration corrector and charged particle beam apparatus using the same
- 专利标题（中）： 畸变校正器和使用其的带电粒子束装置
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申请号： US12187635申请日： 2008-08-07
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公开(公告)号： US07834326B2公开(公告)日： 2010-11-16
- 发明人: Takeshi Kawasaki , Noboru Moriya , Tomonori Nakano , Kotoko Hirose
- 申请人： Takeshi Kawasaki , Noboru Moriya , Tomonori Nakano , Kotoko Hirose
- 申请人地址： JP Tokyo
- 专利权人： Hitachi High-Technologies Corporation
- 当前专利权人： Hitachi High-Technologies Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Mattingly & Malur, P.C.
- 优先权： JP2007-206655 20070808
- 主分类号： H01J1/50
- IPC分类号： H01J1/50
摘要：
The present invention provides an aberration corrector giving excellent assembly accuracy but having fewer parts and fewer adjustment locations in number. In order to achieve it, a multistage multipole is formed by arranging plural combinations of electrodes around an optical axis using alignment blocks, each combination of electrodes being made by brazing-integrating plural electrodes with a ceramic material interposed therebetween.
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