发明授权
- 专利标题: Method of fabricating thin film transistor
- 专利标题(中): 制造薄膜晶体管的方法
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申请号: US11972847申请日: 2008-01-11
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公开(公告)号: US07834352B2公开(公告)日: 2010-11-16
- 发明人: Tae Woo Lee , Young Hun Byun , Yi Yeol Lyu , Sang Yoon Lee , Bon Won Koo
- 申请人: Tae Woo Lee , Young Hun Byun , Yi Yeol Lyu , Sang Yoon Lee , Bon Won Koo
- 申请人地址: KR Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR2004-86229 20041027
- 主分类号: H01L31/00
- IPC分类号: H01L31/00
摘要:
A method of fabricating a thin film transistor, in which source and drain electrodes are formed through a solution process, even all stages which include formation of electrodes on a substrate, formation of an insulator layer, and formation of an organic semiconductor layer are conducted through the solution process. In the method, the fabrication is simplified and a fabrication cost is reduced. It is possible to apply the organic thin film transistor to integrated circuits requiring high speed switching because of high charge mobility.
公开/授权文献
- US20080135839A1 Method of Fabricating Thin Film Transistor 公开/授权日:2008-06-12
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