Invention Grant
- Patent Title: Method of fabricating thin film transistor
- Patent Title (中): 制造薄膜晶体管的方法
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Application No.: US11972847Application Date: 2008-01-11
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Publication No.: US07834352B2Publication Date: 2010-11-16
- Inventor: Tae Woo Lee , Young Hun Byun , Yi Yeol Lyu , Sang Yoon Lee , Bon Won Koo
- Applicant: Tae Woo Lee , Young Hun Byun , Yi Yeol Lyu , Sang Yoon Lee , Bon Won Koo
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR2004-86229 20041027
- Main IPC: H01L31/00
- IPC: H01L31/00

Abstract:
A method of fabricating a thin film transistor, in which source and drain electrodes are formed through a solution process, even all stages which include formation of electrodes on a substrate, formation of an insulator layer, and formation of an organic semiconductor layer are conducted through the solution process. In the method, the fabrication is simplified and a fabrication cost is reduced. It is possible to apply the organic thin film transistor to integrated circuits requiring high speed switching because of high charge mobility.
Public/Granted literature
- US20080135839A1 Method of Fabricating Thin Film Transistor Public/Granted day:2008-06-12
Information query
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