Invention Grant
US07838393B2 Process for collective manufacturing of small volume high precision membranes and cavities 有权
小容量高精度膜和腔体的集体制造工艺

Process for collective manufacturing of small volume high precision membranes and cavities
Abstract:
The invention relates to a process for collective manufacturing of cavities and/or membranes (24), with a given thickness d, in a wafer said to be a semiconductor on insulator layer, comprising at least one semiconducting surface layer with a thickness d on an insulating layer, this insulating layer itself being supported on a substrate, this process comprising: etching of the semiconducting surface layer with thickness d, the insulating layer forming a stop layer, to form said cavities and/or membranes in the surface layer.
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